Spacer and manufacturing device for the same

ABSTRACT

A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Wherein, light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, a flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a spacer for a liquid crystal panel,and more particularly to a spacer and a manufacturing device for thesame.

2. Description of Related Art

With the development of the display technology, a liquid crystal panelis widely applied. However, the liquid crystal panel is formed byinjecting liquid crystal molecules between an array substrate and acolor filter substrate. The structure of the liquid crystal paneldecides that when an external temperature is changed, a materialexpansion or a material shrinkage of the glass substrate and the liquidcrystal molecules. Besides, the liquid crystal product usually suffersan external force impact such as a touch so that a misalignment of thesubstrates of the liquid crystal display panel is easily generated so asto cause a light leakage problem of the panel. Accordingly, adverseimpacts of the display effect such as wrong display colors or baddisplay effect is generated.

In order to increase a supporting effect at a periphery region of theliquid crystal display device, and preventing the liquid crystal displaydevice from generating a deformation in a later module process by anexternal force. In the conventional art, protruding cylindrical postspacers (PS) are disposed on the color filter substrate in order tosupport a gap between the array substrate and the color filter substrateso as to maintain a uniform cell thickness. The post spacers can bedivided into main post spacers and sub post spacers. A height of themain post spacer is higher than a height of the sub spacer. After thearray substrate and the color filter substrate are bonded, the main postspacers abut against the array substrate, and the sub post spacers donot abut against the array substrate. The main spacers support theliquid crystal panel in a normal working environment. When an externalpressure applied on the liquid crystal panel is too large, the sub postspacers can abut against the array substrate in order to increase anentire supporting strength.

The structure of the main post spacer and the sub post spacer is aprismatic platform or a prismatic column which having a trapezoidalcross section. The main post spacers support the array substrate and thesub post spacers are floating to realize an auxiliary supportingfunction. However, in the above design, the main post spacer and the subpost spacer are manufactured independently. When surface manufacturingmethods for the main post spacer and the sub post spacer are different,the roughness is different. A level difference between the main postspacer and the sub post spacer cannot be controlled precisely. A postspacer having a convex-shaped cross section is designed. That is, on aterminal surface of a normal post spacer, an extension portion having asmaller size is formed. The post spacer has a gradient such that when adisplay panel is compressed, a second gradient can abut against thearray substrate so as to function as the sub post spacer. Comparing tothe main post spacer and the sub post spacer which are manufacturedindependently, the structure does not require independentlymanufacturing a stepped portion to realize a level difference betweenthe main post spacer and the sub post spacer in order to increase apixel aperture ratio. However, a manufacturing process for the postspacer having a convex-shaped cross section requires two exposureprocesses. First, through a first exposure process to manufacture a subpost spacer having a first gradient, and then, through a second exposureprocess to manufacture a stepped portion on the sub post spacer in orderto form a main post spacer having a second gradient. However, twoexposure processes require two photo masks. Similarly, two exposureprocesses are required so that the manufacturing cost is still high.

SUMMARY OF THE INVENTION

In order to overcome the drawbacks of the conventional art, the presentinvention provides a spacer and a manufacturing device for the same,which has a high pixel aperture ratio and an easy manufacturing process.

In order to achieve the above purpose, a technology solution adopted bythe present invention is: a spacer manufacturing device, comprising: aphoto mask having a central light-transmitting region and a peripherallight-transmitting region disposed at a periphery of the centrallight-transmitting region; and an exposure device right opposite to thephoto mask; wherein, light emitted from the exposure device isirradiated to a negative photoresist material after passing through thephoto mask, the light intensity passing through the peripherallight-transmitting region is less than the light intensity passingthrough the central light-transmitting region

Wherein, the light transmittance of the central light-transmittingregion is greater than the light transmittance of the peripherallight-transmitting region.

Wherein, the peripheral light-transmitting region has multiplesub-light-transmitting regions and multiple light-shielding regionsarranged alternately, and one of the multiple light-shielding regionsseparates the central light-transmitting region from thesub-light-transmitting regions.

Wherein, the sub-light-transmitting regions and the light-shieldingregions are all symmetric about a center, and symmetry centers of thesub-light-transmitting regions and the light-shielding regions are thesame as a symmetry center of the central light-transmitting region.

Wherein, the number of the photo mask is multiple, and the number ofsub-light-transmitting regions of each photo mask is different.

Wherein, the number of the photo mask is multiple, and widths ofsub-light-transmitting regions of each photo mask are different.

Wherein, the number of the photo mask is multiple, and widths oflight-shielding regions of each photo mask are different.

Wherein, the peripheral light-transmitting region is evenly distributedwith multiple dotted sub-light-transmitting regions.

Wherein, the device further includes an exposure regulation device forregulating irradiation parameters of the exposure device.

Wherein, the exposure regulation device includes an exposure distanceregulation module, an exposure angle regulation module and a timer.

Another purpose of the present invention is to provide a spacer which ismanufactured by the above spacer manufacturing device.

The spacer manufacturing device of the present invention disposes acentral light-transmitting region and a peripheral light-transmittingregion which having different light intensity on a same photo mask suchthat after the lights emitted from the exposure device irradiates on thenegative photoresist material, the light intensity at a center and thelight intensity at a periphery are different so that a height of aspacer formed at the center region is greater than a height of a spacerformed at the periphery region. Accordingly, only one exposure processis required to realize the spacer having a convex-shaped cross section.The process is simple and the manufacturing cost is low. At the sametime, the manufacturing device also includes multiple photo masks. Ashape and a size of the peripheral light-transmitting region of eachphoto mask are different. Besides, a density and a width of thesub-light-transmitting regions can be increased or the irradiationparameters of the exposure device can be regulated to adjust auniformity of the peripheral light-transmitting region of the photomask. Finally, a flatness of the convex shoulder of the spacer having aconvex-shaped cross section is adjustable, which can satisfy therequirement for manufacturing spacers having different specifications.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic diagram of a display panel according to anembodiment of the present invention;

FIG. 2 is a schematic diagram of a spacer manufacturing device accordingto an embodiment of the present invention;

FIG. 3 is a portion enlarged diagram of the portion A in FIG. 2;

FIG. 4a is a schematic diagram of a photo mask according to anembodiment of the present invention;

FIG. 4b is a schematic diagram of another photo mask according to anembodiment of the present invention;

FIG. 4c is a schematic diagram of another photo mask according to anembodiment of the present invention;

FIG. 4d is a schematic diagram of another photo mask according to anembodiment of the present invention;

FIG. 5a is a light intensity distribution diagram after irradiatedthrough the mask shown in FIG. 4 a;

FIG. 5b is a light intensity distribution diagram after irradiatedthrough the mask shown in FIG. 4 b;

FIG. 5c is a light intensity distribution diagram after irradiatedthrough the mask shown in FIG. 4c ; and

FIG. 5d is a light intensity distribution diagram after irradiatedthrough the mask shown in FIG. 4 d.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

The following content combines with the drawings and the embodiment fordescribing the present invention in detail. It is obvious that thefollowing embodiments are only some embodiments of the presentinvention. For the person of ordinary skill in the art without creativeeffort, the other embodiments obtained thereby are still covered by thepresent invention.

With reference to FIG. 1, the display panel of the present inventionincludes an upper color filter substrate 1, a lower array substrate 2,and liquid crystal molecules filled between the color filter substrate 1and the array substrate 2. At the same time, a spacer 4 having aconvex-shaped cross section is located between the color filtersubstrate 1 and the array substrate 2, and supports the color filtersubstrate 1 and the array substrate 2. Besides, the spacer 4 having aconvex-shaped cross section has both functions of a main post spacer(PS) and a sub post spacer (PS). The spacer 4 having a convex-shapedcross section can be a stacked structure stacked by a cylindricalcolumn, a cylindrical platform or a prismatic platform.

As shown in FIG. 2 and FIG. 3, in order to manufacturing the spacer 4having a convex-shaped cross section. The embodiment of the presentinvention provides a spacer manufacturing device, including a photo mask10, and an exposure device 20 right opposite to the photo mask 10. Thecolor filter substrate 1 is coated with a negative photoresist materiallocated below the photo mask 10. The lights emitted from the exposuredevice 20 irradiate a designated portion on the negative photoresistmaterial after transmission through the photo mask 10. After thenegative photoresist material is exposed and developed, removing aportion of the negative photoresist material that is not irradiated bythe lights, a remaining portion of the negative photoresist materialforms the spacer 4 after drying.

With combined reference to FIG. 4a to FIG. 4d , which show various kindsof the photo masks in different shapes. The photo mask 10 of the presentembodiment includes a central light-transmitting region 10 a and aperipheral light-transmitting region 10 b disposed at a periphery of thecentral light-transmitting region 10 a. The other portion of the photomask 10 cannot transmit light. When the light emitted from the exposuredevice 20 irradiates on the negative photoresist material after passingthrough the photo mask 10, the light intensity passing through theperipheral light-transmitting region 10 b is less than the lightintensity passing through the central light-transmitting region 10 a.

The peripheral light-transmitting region 10 b has multiplesub-light-transmitting regions 11 and multiple light-shielding regions12 arranged alternately. One of the multiple light-shielding regions 12separates the central light-transmitting region 10 a from thesub-light-transmitting regions 11.

The sub-light-transmitting regions 11 and the light-shielding regions 12of the present embodiment are all symmetric about a center, and symmetrycenters of the sub-light-transmitting regions 11 and the light-shieldingregions 12 are the same as a symmetry center of the centrallight-transmitting region 10 a.

In FIG. 4a , the central light-transmitting region 10 a is a solidsquare. Each of the sub-light-transmitting regions 11 and thelight-shielding regions 12 is a square-frame structure. In FIG. 4b , thecentral light-transmitting region 10 a is a solid rectangle. Each of thesub-light-transmitting regions 11 and the light-shielding regions 12 isa rectangle-frame structure. In FIG. 4c , the central light-transmittingregion 10 a is a solid circle. Each of the sub-light-transmittingregions 11 and the light-shielding regions 12 is a circular structure.In FIG. 4d , the central light-transmitting region 10 a is a solidcircle. Each of the sub-light-transmitting regions 11 and thelight-shielding regions 12 is a solid circular dot. The peripherallight-transmitting region 10 b is evenly distributed with the dottedsub-light-transmitting regions 11. It can be understood that thestructure of the photo mask of the present invention is not limited tothe above shapes. In the manufacturing process, shapes of the centrallight-transmitting region 10 a, the sub-light-transmitting regions 11and the light-shielding regions 12 can be selected according to anactual requirement. The only requirement is that the symmetry centers ofthe central light-transmitting region 10 a, the sub-light-transmittingregions 11 and the light-shielding regions 12 are the same.

A height of a post spacer depends on the light intensity distribution inan exposure process, the light intensity passing through the centrallight-transmitting region 10 a is stronger, after irradiating thenegative photoresist material, a main spacer portion 4 a having a higherheight (that is, the Main PS) is formed. The light intensity passingthrough the peripheral light-transmitting region 10 b is weaker, afterirradiating a periphery of the negative photoresist material, a subspacer portion 4 b having a lower height (that is, the Sub PS) isformed.

Through utilizing an Athena software with an exposure simulation module(also known as an “Optolith” for one person skilled in the art) forperforming a simulation and verification to different photo maskstructures, light intensity distributions of different spacer designmethods are simulated. FIG. 5a to FIG. 5d respectively simulate and showlight intensity distribution diagrams corresponding to photo maskstructures shown in FIG. 4a to FIG. 4d . As shown, the light intensitydistribution of the central light-transmitting region 10 a is higherthan the other regions. A level difference between the main spacerportion 4 a and the sub spacer portion 4 b can be controlled through alight-transmitting area ratio of the central light-transmitting region10 a to the peripheral light-transmitting region 10 b of the photo mask10. When a light-transmitting area of the peripheral light-transmittingregion 10 b is larger, the level difference is smaller. At the sametime, when the light-shielding regions 12 of the peripherallight-transmitting region 10 b is narrower, and the number of layers ofthe sub-light-transmitting regions 11 is more, a surface of atransitional convex shoulder between the main spacer portion 4 a and thesub spacer portion 4 b is smoother.

At the same time, the spacer manufacturing device 20 also includes anexposure regulation device 30 for regulating irradiation parameters ofthe exposure device 20. In the spacer manufacturing process, becauselights emitted from the exposure device 20 are not completely parallel,a certain of divergence is existed. Therefore, in the exposure process,a portion of the negative photoresist material right opposites to aninterspace is also irradiated by an ultraviolet light. Finally, theexposure effect is not in an ideal design status. Therefore, as shown inFIG. 2, in the present embodiment, the exposure regulation device 30includes an exposure distance regulation module 31, an exposure angleregulation module 32 and a timer 33, which can respectively controlparameters of an exposure distance, an exposure angle and an exposuretime of the exposure device 20. Through controlling the exposuredistance between the exposure device 20 and the photo mask 10, theexposure angle of the exposure device 20, the light intensity of lightspassing through the peripheral light-transmitting region 10 b is evenlydistributed. Combining with controlling the exposure time, a flatness ofthe convex shoulder of the spacer is consistent.

In the spacer design process, in order to realize a multi-level gradienton the spacer having a convex-shaped cross section, a convex shoulder ofthe spacer should be designed as a wavy shape or a surface having agradually changed height. The number of the sub-light-transmittingregions 11 of the photo mask 10 is designed to be at least two. In themanufacturing process, the exposure parameters are slightly regulated bythe exposure regulation device 30.

In order to regulate the flatness of the convex shoulder of the spacerconveniently so as to increase a diversity of the function of theexposure device 20. The spacer manufacturing device of the presentembodiment is provided with multiple photo masks 10 which are convenientfor replacing. For each photo mask 10, the number of thesub-light-transmitting regions 11, a width of eachsub-light-transmitting region 11 and a shape of eachsub-light-transmitting region 11 are different. Besides, a width of thelight-shielding region 12 of each photo mask 10 is different. The photomasks can be selected freely in the manufacturing process.

In another embodiment, the light transmittance of the centrallight-transmitting region 10 a is greater than the light transmittanceof the peripheral light-transmitting region 10 b to realize alight-transmitting difference between the central light-transmittingregion 10 a and the peripheral light-transmitting region 10 b.Therefore, the level difference between the main spacer portion 4 a andthe sub spacer portion 4 b is realized.

The spacer manufacturing device of the present invention disposes acentral light-transmitting region and a peripheral light-transmittingregion which having different light intensity on a same photo mask suchthat after the lights emitted from the exposure device irradiates on thenegative photoresist material, the light intensity at a center and thelight intensity at a periphery are different so that a height of aspacer formed at the center region is greater than a height of a spacerformed at the periphery region. Accordingly, only one exposure processis required to realize the spacer having a convex-shaped cross section.The process is simple and the manufacturing cost is low. At the sametime, the manufacturing device also includes multiple photo masks. Ashape and a size of the peripheral light-transmitting region of eachphoto mask are different. Besides, a density and a width of thesub-light-transmitting regions can be increased or the irradiationparameters of the exposure device can be regulated to adjust auniformity of the peripheral light-transmitting region of the photomask. Finally, a flatness of the convex shoulder of the spacer having aconvex-shaped cross section is adjustable, which can satisfy therequirement for manufacturing spacers having different specifications.

What is claimed is:
 1. A spacer manufacturing device, comprising: aphoto mask having a central light-transmitting region and a peripherallight-transmitting region disposed at a periphery of the centrallight-transmitting region; and an exposure device right opposite to thephoto mask; wherein, light emitted from the exposure device isirradiated to a negative photoresist material after passing through thephoto mask, the light intensity passing through the peripherallight-transmitting region is less than the light intensity passingthrough the central light-transmitting region; wherein the peripherallight-transmitting region includes multiple sub-light-transmittingregions and multiple light-shielding regions arranged alternately, andone of the multiple light-shielding regions separates the centrallight-transmitting region from the sub-light-transmitting regions;wherein the central light-transmitting region is a solid structure;wherein the central light-transmitting region is a solid square, andeach of the multiple sub-light-transmitting regions and the multiplelight-shielding regions is a square-frame structure; wherein thesub-light-transmitting regions and the light-shielding regions are allsymmetric about a center, and symmetry centers of thesub-light-transmitting regions and the light-shielding regions are thesame as a symmetry center of the central light-transmitting region; andwherein the number of the photo mask is multiple, and widths ofsub-light-transmitting regions of each photo mask are different.
 2. Thespacer manufacturing device according to claim 1, wherein the devicefurther includes an exposure regulation device for regulatingirradiation parameters of the exposure device.
 3. The spacermanufacturing device according to claim 2, wherein the exposureregulation device includes an exposure distance regulation module, anexposure angle regulation module and a timer.
 4. A spacer which ismanufactured by a spacer manufacturing device, wherein the spacermanufacturing device includes a photo mask having a centrallight-transmitting region and a peripheral light-transmitting regiondisposed at a periphery of the central light-transmitting region; and anexposure device right opposite to the photo mask; wherein, light emittedfrom the exposure device is irradiated to a negative photoresistmaterial after passing through the photo mask, the light intensitypassing through the peripheral light-transmitting region is less thanthe light intensity passing through the central light-transmittingregion; wherein the peripheral light-transmitting region includesmultiple sub-light-transmitting regions and multiple light-shieldingregions arranged alternately, and one of the multiple light-shieldingregions separates the central light-transmitting region from thesub-light-transmitting regions; wherein the central light-transmittingregion is a solid structure; wherein the central light-transmittingregion is configured with a shape selected from one of a solid squareand a solid rectangle; wherein when the central light-transmittingregion is the solid square shape, then each of the multiplesub-light-transmitting regions and the multiple light-shielding regionsis configured with the square-frame structure; wherein when the centrallight-transmitting region is the solid rectangle shape, then each of themultiple sub-light-transmitting regions and the multiple light-shieldingregions is configured with the rectangle-frame structure; wherein thesub-light-transmitting regions and the light-shielding regions are allsymmetric about a center, and symmetry centers of thesub-light-transmitting regions and the light-shielding regions are thesame as a symmetry center of the central light-transmitting region; andwherein the number of the photo mask is multiple, and widths oflight-shielding regions of each photo mask are different.
 5. The spaceraccording to claim 4, wherein the spacer manufacturing device furtherincludes an exposure regulation device for regulating irradiationparameters of the exposure device.
 6. The spacer according to claim 5,wherein the exposure regulation device includes an exposure distanceregulation module, an exposure angle regulation module and a timer.